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VIISta vMask is an implant mask available exclusively for Varian VIISta series ion implanters. By precisely masking portions of a silicon wafer, VIISta vMask enables customers to run multiple implant splits on a wafer. vMask significantly reduces chip development cost.
Benefits
Reduces number of wafers required for development
Reduces the impact of wafer-to-wafer variations
Shortens the time to market for new designs
Available as an option on new VIISta ion implanters and as an upgrade for installed systems
Features
Four split-lot implants per wafer, each with a unique recipe
Automated mask positioning, host or manual control
Fully retractable and compatible with production tool requirements
Prerequisites
VIISta roplat and universal endstation
Version 6.90 sw and above
Available VIISta Systems
Medium Current: VIISta 810HP, 810EHP, 810XE, 810XEr, 810XP and 900XP models
High Current: VIISta 80HP, HC and HCP models
Product Families
VIISta Platform
Overview
High Current
Overview
VIISta HCS
VIISta HCP
VIISta HC
Medium Current
Overview
VIISta 810XP
VIISta 810XEr
VIISta 900XP
High Energy
Overview
VIISta 3000XP
Ultra High Dose
Overview
Solion
Overview
Upgrade Products
VIISta SuperScan
VIISta vMASK
Related Information
Collateral
VIISta vMask Data Sheet
(PDF)
Animation
Related Links
Service and Support
Spares and Consumables
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