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| VIISta Platform |
| Varian Semiconductor’s full suite of high current, medium current and high energy ion implanters are based on a common platform. |
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Our unique platform leverages common technologies optimized for single-wafer systems, including:
- The Varian Control System (VCS™)
- The Varian Positioning System (VPS™)
- Single-wafer endstation
- Dual-magnet ribbon beam architecture
This proven platform offers:
- Highest industry throughput
- Production-proven, reliable wafer handling
- Superior contamination performance
- Commonality in most components and procedures
- Cost-effective operation cost
This platform provides customers with flexibility in managing overall bay productivity, resulting in:
- Decreased time to first silicon
- Greater productivity across all applications
- Flexible product mix changes
- Cost-effective training
The VIISta platform enables the transition from batch to single-wafer systems by providing all of the advantages of precise angle control and superior particle performance, while maximizing productivity.
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