 |
|
|
|
|
|
|
|
| The VIISta 3000XP, built on the acclaimed Varian dual-magnet single-wafer architecture, delivers the angle precision required for advanced high-energy applications. Below the 65nm technology node, the limitations of conventional batch high-energy implanters create device performance issues for high-energy processes. Single-wafer architecture is required to achieve the precise angle control, dose control, and productivity demands for next-generation device manufacturing. |
|
|
|
 |
|
The VIISta 3000XP is also ideally suited for medium-current back-up. The system features the same single-wafer endstation, dosimetry system, and wafer positioning system as the market-leading medium-current VIISta 900XP.
With a wide energy range covering 10keV up to 3.75MeV, the VIISta 3000XP also provides the highest mechanical throughput in its class at 400WPH.
|
 |
|
|
|
|
|